Anders Kvennefors
Research engineer
Optimization of a self-closing effect to produce nanochannels with top slits in fused silica
Author
Summary, in English
The authors report on the fabrication of subsurfaced 100-600 nm wide nanochannels in fused silica with top slit openings in the size range of 5-10 nm. Such nanochannels can be used in combination with a nanofluidics system to guide molecular motors and quickly switch the chemical environment inside the nanochannels through diffusion via the top slits. To realize nanochannel top slits in this size range, the authors here demonstrate the use of a self-closing effect based on the volume expansion of a thin Si layer during oxidation. A high contrast electron beam lithography exposure step in conjunction with dry etching of SiO2 by reactive ion etching (RIE) and Si by inductively coupled plasma-RIE followed by wet etching of a fused silica substrate is used to create the initial slit before oxidation. The details of nanochannel fabrication steps are described and discussed. (C) 2012 American Vacuum Society. [http://dx.doi.org/10.1116/1.4766317]
Department/s
- Solid State Physics
- NanoLund: Centre for Nanoscience
Publishing year
2012
Language
English
Publication/Series
Journal of Vacuum Science and Technology B
Volume
30
Issue
6
Document type
Journal article
Publisher
American Institute of Physics (AIP)
Topic
- Nano Technology
- Condensed Matter Physics
- Other Physics Topics
Status
Published
ISBN/ISSN/Other
- ISSN: 1520-8567